Method for discharging static charges on reticle

ABSTRACT

A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.

CROSS REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application No.62/589,240, filed on Nov. 21, 2017, the entirety of which isincorporated by reference herein.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experienced rapidgrowth. Technological advances in IC materials and design have producedgenerations of ICs where each generation has smaller and more complexcircuits than the previous generation. However, these advances haveincreased the complexity of processing and manufacturing ICs and, forthese advances to be realized, similar developments in IC processing andmanufacturing are needed. In the course of IC evolution, functionaldensity (i.e., the number of interconnected devices per chip area) hasgenerally increased while geometric size (i.e., the smallest componentthat can be created using a fabrication process) has decreased.

In one example associated with lithography patterning, a photomask (ormask) for use in a lithography process has a circuit pattern definedthereon that is to be transferred to wafers. In advanced lithographytechnologies, an extreme ultraviolet (EUV) lithography process isimplemented with a reflective mask. It is important that the EUV mask beas clean and defect-free as possible.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It shouldbe noted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a top view of a reticle, in accordance with some embodiments;and

FIG. 2A is a cross-sectional view taken along line A-A′ of FIG. 1,showing a cross-sectional view of a reticle, in accordance with someembodiments;

FIG. 2B is a cross-sectional view taken along line B-B′ of FIG. 1,showing a cross-sectional view of a reticle, in accordance with someembodiments;

FIGS. 3A-3D are side-views of a reticle, showing various arrangements ofa conductive material structure on a sidewall surface of the reticle, inaccordance with some embodiments;

FIG. 4 is an explosive view of a reticle container, in accordance withsome embodiments;

FIG. 5A is a top view of a baseplate of an inner pod of a reticlecontainer, in accordance with some embodiments;

FIG. 5B is a bottom view of a baseplate of an inner pod of a reticlecontainer, in accordance with some embodiments;

FIG. 5C is a cross-sectional view taken along line A-A′ of FIG. 5A,showing a baseplate of an inner pod of a reticle container, inaccordance with some embodiments;

FIG. 6 is schematic view of alpha particles emitted form a dischargingdevice;

FIG. 7 is a schematic view of a lithography system, in accordance withsome embodiments;

FIG. 8 is a flowchart of a method for discharging static chargesaccumulated on a reticle, in accordance with some embodiments;

FIG. 9 shows a schematic view of a stage of a method for dischargingstatic charges accumulated on a reticle, in accordance with someembodiments;

FIG. 10 shows a schematic view of a stage of a method for dischargingstatic charges accumulated on a reticle, in accordance with someembodiments;

FIG. 11 shows a schematic view of a stage of a method for dischargingstatic charges accumulated on a reticle, in accordance with someembodiments;

FIG. 12 shows a schematic view of a stage of a method for dischargingstatic charges accumulated on a reticle, in accordance with someembodiments;

FIG. 13 shows a schematic view of a stage of a method for dischargingstatic charges accumulated on a reticle, in accordance with someembodiments; and

FIG. 14 shows a schematic view of one stage of a method for dischargingstatic charges accumulated on a reticle as the reticle is positioned ona reticle electrostatic-clamp, in accordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows includes embodiments in which the first and second features areformed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact.The present disclosure may repeat reference numerals and/or letters insome various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between somevarious embodiments and/or configurations discussed.

Furthermore, spatially relative terms, such as “beneath,” “below,”“lower,” “above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Some embodiments of the disclosure are described. Additional operationscan be provided before, during, and/or after the stages described inthese embodiments. Some of the stages that are described can be replacedor eliminated for different embodiments. Additional features can beadded to the semiconductor device structure. Some of the featuresdescribed below can be replaced or eliminated for different embodiments.Although some embodiments are discussed with operations performed in aparticular order, these operations may be performed in another logicalorder.

The advanced lithography process, method, and materials described in thecurrent disclosure can be used in many applications, including fin-typefield effect transistors (FinFETs). For example, the fins may bepatterned to produce relatively close spacing between features, forwhich the above disclosure is well suited. In addition, spacers used informing fins of FinFETs can be processed according to the abovedisclosure.

FIG. 1 is a top view of a reticle 400, in accordance with someembodiments. FIG. 2A is a cross-sectional view of the reticle 400 takenalong line A-A′ of FIG. 1. FIG. 2B is a cross-sectional view of thereticle 400 taken along line B-B′ of FIG. 1. As shown in FIG. 1, FIG. 2Aand FIG. 2B, the reticle 400 may have a front-side surface 252 and aback-side surface 254 opposite to the front-side surface 252. In someembodiments, the reticle 400 includes a stack 250 and a conductivematerial structure 220 covering a sidewall surface 205 of the stack 250.In should be noted that FIG. 1 is used to illustrate various portionsarranged on the reticle 400 and reticle patterns (e.g., an absorptionstructure 212 shown in FIG. 2A and FIG. 2B) are not shown in FIG. 1 forclarity.

In some embodiments, the reticle 400 includes a pattern region 410, aborder region 420 and a bridge region 432. In some embodiments, thepattern region 410 is located in the center portion of the reticle 400.In certain embodiments, the border region 420 may surround the patternregion 410. In such embodiments, the pattern region 410 may be separatedfrom the border region 420 by a trench 430 as shown in FIG. 2A. Thetrench 430 may partially surround the pattern region 410, in someembodiments as shown in FIG. 1. The reticle 400 may include one or morebridge region 432 positioned between the pattern region 410 and theborder region 420. The bridge region 432 of the reticle 400 mayinterconnect a portion of the pattern region 410 and a portion of theborder region 420, as shown in FIG. 2B.

In some embodiments, the reticle 400 is an extreme ultraviolet (EUV)reticle. The EUV lithography process utilizes a reflective reticlerather than a transmissive reticle. The EUV lithography process utilizesEUV scanners that emit light in the extreme ultraviolet (EUV) region,which is light having an extreme ultraviolet wavelength, such as 10-15nm. In some embodiments, the EUV source generates EUV with wavelength atabout 13.6 nm. Some EUV scanners may use reflective optics, i.e. mirrorsand work in the vacuum environment. EUV scanners may provide the desiredpattern on an absorption layer (e.g., an “EUV” reticle absorber) formedon a reflective reticle. Within the EUV range, all materials are highlyabsorbing. Thus, reflective optics rather than refractive optics areused.

In some embodiments, the stack 250 of the reticle 400 includes a masksubstrate 200, a reflective multilayer (ML) structure 206, a cappinglayer 210 and an absorption structure 212 as illustrated in FIG. 2A. Inaddition, the mask substrate 200, the reflective ML structure 206, thecapping layer 210 and the absorption structure 212 may be positioned inthe pattern region 410, the border region 420 and the bridge region 430of the reticle 400 according to certain embodiments of the presentdisclosure.

As shown in FIGS. 2A and 2B, the mask substrate 200 of the stack 250 mayhave a front-side surface 201 and a back-side surface 203 opposite tothe front-side surface 201. The mask substrate 200 may be made of asuitable material, such as a low thermal expansion material (LTEM) orfused quartz. In some embodiments, the LTEM includes TiO₂ doped SiO₂, orother suitable materials with low thermal expansion.

The reflective ML structure 206 of the stack 250 may be positioned overthe front-side surface 201 of the mask substrate 200. In accordance withthe Fresnel equations, light reflection occurs when light propagatesacross an interface between two materials of different refractiveindices. The greater the difference between the refractive indices oflayers, the higher the intensity of the reflected light becomes as itpropagates across the layers. To increase the intensity of the reflectedlight, in some embodiments, a multilayer of alternating materials may beused to increase the number of interfaces so as to cause the lightreflected from each of the different interfaces to interfereconstructively. In some embodiments, the reflective ML structure 206includes a plurality of film pairs, such as molybdenum-silicon (Mo/Si)film pairs (e.g. a layer of molybdenum above or below a layer of siliconin each film pair). In some other embodiments, the reflective MLstructure 206 may include molybdenum-beryllium (Mo/Be) film pairs, orother suitable materials that are configurable to highly reflect the EUVlight. The characteristics of the reflective ML structure 206 areselected such that it provides a high reflectivity to a selectedelectromagnetic radiation type/wavelength. For example, for the purposeof EUV lithography, the reflective ML structure 206 may be designed toreflect light within the EUV range. The thickness of each layer of thereflective ML structure 206 depends on the EUV wavelength and theincident angle. Particularly, the thickness of the reflective MLstructure 206 (and the thicknesses of the film pairs) may be adjusted toachieve a maximum constructive interference of the EUV light diffractedat each interface and a minimum absorption of the EUV light. In someembodiments, the number of the film pairs in the reflective ML structure206 may be in a range from about 20 to about 80. However, any number offilm pairs may be used. For example, the reflective ML structure 206 mayinclude forty pairs of layers of Mo/Si. For example, each Mo/Si filmpair has a thickness of about 7 nm and the reflective ML structure 206has a total thickness of 280 nm.

In some embodiments, the capping layer 210 of the stack 250 ispositioned over the reflective ML structure 206. The capping layer 210is designed to be transparent to EUV light and to protect the reflectiveML structure 206 from damage and/or oxidation. In addition, the cappinglayer 210 may serve as an etching stop layer in a patterning orrepairing/cleaning process of the absorption structure 212 over thecapping layer 210. The capping layer 210 may have different etchingcharacteristics from the absorption layer. In some embodiments, thecapping layer 210 is formed of ruthenium (Ru), Ru compounds such as RuBand RuSi, chromium (Cr), Cr oxide, and Cr nitride. A low temperaturedeposition process may be often chosen for forming the capping layer 210so as to prevent inter-diffusion of the reflective ML structure 206. Thethickness of the capping layer 210 may be in a range from about 2 nm toabout 7 nm in certain embodiments.

The absorption structure 212 of the stack 250 may be positioned over thecapping layer 210. The absorption structure 212 is used to form thedesired exposure pattern (e.g., the absorption structure 212 in thepattern region 410) onto the front-side surface 252 of the reticle 400.In some embodiments, the absorption structure 212 is an absorptionmaterial to absorb radiation in the EUV wavelength range projected ontothe pattern region 410 of the reticle 400. For example, the reticle 400can be referred to as a Binary Intensity Reticle (BIM). In someembodiments, the absorption layer 210 may be patterned according to anIC layout pattern (or simply IC pattern). For example, the absorptionlayer 210 may be patterned to form opaque regions 214 and reflectiveregions 216. In the opaque region 214, the absorption layer 210 mayremain on the stack 250. An incident light is almost fully absorbed bythe absorber. In the reflective regions 216, the absorption layer 210may be removed and the incident light is reflected by the underlyingreflective ML structure 206. In some embodiments, the absorptionstructure 212 in the pattern region 410 and the absorption structure 212in the border region 420 are electrically connected to the capping layer210.

In some examples, the absorption structure 212 may include multiple filmlayers with each film containing chromium, chromium oxide, chromiumnitride, titanium, titanium oxide, titanium nitride, tantalum, tantalumoxide, tantalum nitride, tantalum oxynitride, tantalum boron nitride,tantalum boron oxide, tantalum boron oxynitride, aluminum,aluminum-copper, aluminum oxide, silver, silver oxide, palladium,ruthenium, molybdenum, other suitable materials, and/or mixture of someof the above.

In some embodiments, the reticle 400 further includes a conductive layer218 positioned on the back-side surface 203 of the mask substrate 200for the electrostatic chucking purpose. In some embodiments, theconductive layer 218 includes tantalum boron (TaB), chromium nitride(CrN), though other suitable compositions are possible in otherembodiments according to the present disclosure.

In some embodiments, the conductive material structure 220 is positionedover a sidewall surface 211 of the mask substrate 200 and a sidewallsurface 213 of the absorption structure 212. The conductive materialstructure 220 may surround the conductive layer 218. The conductivematerial structure 220 of the reticle 400 may be in contact with theabsorption structure 212 and the conductive layer 218. In addition, theconductive material structure 220 of the reticle 400 may be in contactwith the reflective ML structure 206 and the capping layer 210.Furthermore, the conductive material structure 220 may be in contactwith the absorption structure 212 in the border region rather than theabsorption structure 212 in the pattern region 410. In some embodiments,the conductive material structure 220 is formed of metals includingcopper, aluminum, aluminum-copper, cobalt, tungsten, silver, palladium,ruthenium, molybdenum, other suitable materials, and/or mixture of someof the above. In some embodiments, the conductive material structure 220may have different etching characteristics from the absorption structure212. For example, the conductive material structure 220 may be formed ofruthenium (Ru), Ru compounds such as RuB, RuSi, chromium (Cr), Cr oxide,and Cr nitride. In some embodiments, the conductive material structure220 may be formed by a physical vapor deposition (PVD) process (e.g. anelectro-plating process), an atomic layer deposition (ALD) process, oranother applicable process. In addition, the conductive materialstructure 220 may be formed by a low temperature deposition process.

FIGS. 3A-3D are side-views of the reticle 400A, 400B, 400C and 400Daccording to certain embodiments of the present disclosure. In addition,FIGS. 3A-3D illustrate various arrangements of conductive materialstructures 220A, 220B, 220C and 220D in accordance with certainembodiments. For example, as shown in FIG. 3A, the conductive materialstructure 220A may be formed on the entire sidewall 205 of the stack 250of the reticle 400A. For example, as shown in FIG. 3B, the conductivematerial structure 220B may be formed covering a portion of the sidewall205 of the stack 250 of the reticle 400B. The conductive materialstructure 220B may include a plurality of conductive strips 220B1according to certain embodiments of the present disclosure. Each of theconductive strips 220B1 of the conductive material structure 220B mayhave a width W. The conductive strips 220B1 of the conductive materialstructure 220B may be separated from each other by a distance D. In someembodiments, two terminals 222 and 224 of each of the conductive strips220B1 of the conductive material structure 220B are respectively incontact with the absorption structure 212 and the conductive layer 218of the stack 250 of the reticle 400B. For example, as shown in FIG. 3C,the conductive material structure 220C is formed covering a portion ofthe sidewall 205 of the stack 250 of the reticle 400C. The conductivematerial structure 220C may be grid-shaped. The conductive materialstructure 220C may be constructed by spaced bars that are parallel to orcross each other. In some embodiments, terminals of some spaced bars arerespectively in contact with the absorption structure 212 and theconductive layer 218 of the reticle 400C. For example, as shown in FIG.3D, the conductive material structure 220D may be spiral-shaped and maycover a portion of the sidewall 205 of the stack 250 of the reticle400D. The conductive material structure 220D may be formed about an axis260 perpendicular to the front-side surface 201 of the mask substrate200. In some embodiments, two terminals 226 and 228 of each of theconductive material structure 220D are respectively in contact with theabsorption structure 212 and the conductive layer 218 of the reticle400D.

In some common used reticles, opaque regions of an absorption structure(e.g. reticle patterns) in a pattern region may have a relatively smallarea and have no enough conductive paths between a front-side surfaceand a back-side surface of the reticle. As such, when the lithographyexposure process is performed in a lithography system, the back-sidesurface of the reticle is clamped on a reticle electrostatic-clamp by anelectrostatic force generated by the reticle electrostatic-clamp. Inaddition, induced static charges caused by the electrostatic force mayaccumulate on a front-side surface of the reticle. The induced staticcharges form a relative high static electric field on the opaque regionsof an absorption structure and cause the electrostatic discharge damage.

In some embodiments, the reticle (e.g., the reticle 400, 400A, 400B,400C and 400D) includes the conductive material structure (e.g., theconductive material structures 220, 220A, 220B, 220C and 220D) coveringthe sidewall surface 205 of the stack 250. The conductive materialstructure may be in contact with the absorption structure 212 and theconductive layer 218. In addition, the absorption structure 212 may bepositioned close to the front-side surface 252 and the conductive layer218 may be positioned close to a back-side surface 254 of the reticle400. Such arrangement of the conductive material structure may conductthe static charges accumulated on the front-side surface 252 of thereticle 400 to the reticle electrostatic-clamp when the conductivematerial structure of the reticle is in contact with the reticleelectrostatic-clamp. Therefore, the conductive material structure mayprotect the opaque regions 214 of the absorption structure 212 (e.g. thereticle patterns) from the electrostatic discharge damage.

When the reticle is shipped or transferred in an ambient environment,molecules of the air may rub the reticle. Static charges may be inducedand accumulated on surfaces of the absorption structure and the masksubstrate. Because each of the reticle patterns has a relatively smallarea, the induced static charges on the absorption structure and themask substrate form a relative high static electric potential thereon.The particulate contamination (such as particles, powders, and organicmatters) that adheres to the reticle due to the electric potential mayresult in degradation of the quality of the projected pattern.Therefore, the reticle may be shipped or transferred by positionedwithin a reticle container in order to maintain the cleanliness of thereticle.

FIG. 4 is an explosive view of the reticle container 500, in accordancewith some embodiments. The reticle container 500, which may be a dualreticle pod, is configured to accommodate the reticle 400. In someembodiments, the reticle container 500 includes an outer pod 510 and aninner pod 540. The outer pod 510 may include a top cover portion 512 anda bottom cover portion 514. The bottom cover portion 514 may engage tothe top cover portion 512 to define a space surrounded by a top surface516 of the bottom cover portion 514 and an inner surface of the topcover portion 512. The bottom cover portion 514 may include supporters518 on the top surface 516, and the top cover portion 512 may includesupporters 520 protruding toward the bottom cover portion 514.Therefore, the space formed by engaging the top cover portion 512 andthe bottom cover portion 514 may accommodate and fasten the inner pod540.

In some embodiments, the inner pod 540 is configured so that the outerpod 510 can fit around the inner pod 540. For example, the inner pod 540may be properly placed in the space defined by the outer pod 510. Inaddition, the inner pod 540 may have proper size and shape correspondingto the outer pod 510. In some embodiments, the inner pod 540 includes acover 542 and a baseplate 544. The cover 542 may be configured toprotect the reticle 400. In addition, the cover 542 may includefasteners 522 positioned close to four corners in a periphery region ofthe cover 542. The fasteners 522 may help the cover 542 fastening to thebaseplate 544. The baseplate 544 may have a top surface 546 and a bottomsurface 548 opposite to the top surface 546. In addition, the baseplate544 may include supporters 524 positioned on the top surface 546. Thesupporters 524 are positioned close to four corners in a peripheryregion of the baseplate 544. Therefore, four corners of the reticle 400may be supported by the supporters 524. The baseplate 544 may beconfigured to engage to the cover 542 to form a space surrounded by thetop surface 546 of the baseplate 544 and an inner surface of the cover542. In addition, the space formed by adjoining the cover 542 and thebaseplate 544 together may accommodate the reticle 400. When the innerpod 540 is fastened in the outer pod 510, the baseplate 544 of the innerpod 540 may be in contact with the supporters 518 of the bottom coverportion 514 of the outer pod 510. The reticle 400 is located in theinner pod 540, and the inner pod 540 is located in the outer pod 510 ofthe reticle container 500. As a result, further protection for thereticle 400 is provided.

FIGS. 5A, 5B and 5C are respectively a top view, a bottom view and across-sectional view of the baseplate 544 of the inner pod 540 of thereticle container 500. In some embodiments, the top surface 546 of thebaseplate 544 has a reticle region 545 and a peripheral region 547surrounding the reticle region 545. The reticle region 545 may beprovided to support the reticle 400 (FIG. 4). The inner pod 540 of thereticle container 500 further includes one or more discharging device550 positioned in the reticle region 545 of the baseplate 544. In someembodiments, the discharging device 550 is configured to neutralizestatic charges accumulated on the reticle 400 when the reticle 400supported by the baseplate 544 is shipped or transferred in an ambientenvironment or in a vacuum environment.

In some embodiments, the discharging device 550 is positioned in arecessed groove 552 of the baseplate 544 as illustrated in FIG. 5C. Inaddition, the discharging device 550 may be fastened by a fixed device(e.g. a screw) 551. The recessed groove 552 may be formed by recessingthe top surface 546 of the baseplate 544 in the reticle region 545. Atop surface 554 of the discharging device 550 may be positioned betweenthe top surface 546 and the bottom surface 548 of the baseplate 544. Inaddition, a bottom surface 556 of the recessed groove 552 may bepositioned between the top surface 546 and the bottom surface 548 of thebaseplate 544. Therefore, the discharging device 550 is exposed to thetop surface 546 of the baseplate 544. When the reticle 400 supported bythe baseplate 544, the top surface 554 of the discharging device 550 mayface the top surface 252 of the reticle 400. Furthermore, the bottomsurface 548 of the baseplate 544 may cover the discharging device 550.

The discharging device 550 may include an alpha-ionizer (not shown). Thealpha-ionizer may be configured to emit alpha particles 560 to collidewith and ionize hydrogen (H₂) in the air to produce positively chargedparticles 562 or negatively charged particles 564 as shown in FIG. 6.The positively charged particles 562 or negatively charged particles 564may attract their counterparts in order to neutralize the static chargeson the reticle 400.

In some embodiments, the reticle container 500 includes the dischargingdevice 550 fixed on the baseplate 544 of the inner pod 540. For example,the discharging device 550 may continuously produce positively chargedparticles or negatively charged particles. For example, the dischargingdevice 550 may intermittently produce positively charged particles ornegatively charged particles by a controller (not shown). When thereticle 400 positioned in the inner pod 540 (or on the baseplate 544) isshipped or transferred in the ambient environment or in the vacuumenvironment, where the induced static charges accumulated on the reticle400 may be neutralized by the discharging device 550. Therefore, thereticle container 500 may prevent the reticle 400 from the particulatecontamination (such as particles, powders, and organic matters).

FIG. 7 is a schematic view of a lithography system 600, in accordancewith some embodiments. In some embodiments, the lithography system 600includes a lithography exposure apparatus. The lithography exposureapparatus may be extreme ultraviolet (EUV) scanners or the like. In someembodiments, the lithography system 600 includes a reticle load/unloadstation 610, a wafer load/unload station 630 and an exposure chamber650. The reticle load/unload station 610 may be configured to load,unload and transfer the reticle 400 within the reticle container 500 inaccordance with certain embodiments. The wafer load/unload station 630may be configured to load, unload and transfer wafers 702 in a wafercontainer 700 in accordance with certain embodiments. In addition, theexposure chamber 650 may be configured to perform the lithographyexposure process. The exposure chamber 650 is connected to the reticleload/unload station 610 and the wafer load/unload station 630. It shouldbe appreciated that the features described below can be replaced oreliminated in other embodiments of the lithography exposure system 600.

In some embodiments, the reticle load/unload station 610 includes areticle load port 612, a reticle interface module 614 and a reticle loadlock chamber 616. The reticle load port 612 may be configured to loadthe reticle container 500, which stores the reticle 400. The reticleinterface module 614 may be configured to handle the inner pod 540 fromthe outer pod 510. The reticle interface module 614 includes a housing613, and one or more transferring means such as a robotic arm 615, inaccordance with some embodiments. In some embodiments, the reticleinterface module 614 includes an equipment front end module (EFEM). Incertain embodiments, the robotic arm 615 is disposed within the housing613 and is configured for physically transporting the inner pod 540. Forexample, the robotic arm 615 may retrieve the inner pod 540 from theouter pod 510 to the housing 613, or the robotic arm 615 may transportthe inner pod 540 to and from the load lock chamber 616. However, thelocations where the robotic arm 615 may transport the inner pod 540 arenot limited by the present embodiment.

The reticle load lock chamber 616 is located between the reticleinterface module 614 and the exposure chamber 650. The reticle load lockchamber 616 is configured for preserving the atmosphere within theexposure chamber 650 by separating it from the reticle interface module614. The reticle load lock chamber 616 is capable of creating anatmosphere compatible with the exposure chamber 650 or the reticleinterface module 614, depending on where the loaded inner pod 540 isscheduled to be next. This can be performed by altering the gas contentof the reticle load lock chamber 616 by such means as adding gas orcreating a vacuum, along with other suitable means for adjusting theatmosphere in the reticle load lock chamber 616.

In some embodiments, the wafer load/unload station 630 includes a waferload port 632, a wafer interface module 634 and a wafer load lockchamber 636. The wafer load port 632 may be configured to load the wafercontainer 700 for storing the wafers 702. The wafer interface module 634may be configured to handle the wafer from the wafer container 700. Thewafer interface module 634 includes a housing 633, and one or moretransferring means such as a robotic arm 635, in accordance with someembodiments. In some embodiments, the wafer interface module 634includes an equipment front end module (EFEM). The robotic arm 635 isdisposed within the housing 633. The robotic arm 635 is configured forphysically transporting the wafer 702. For example, the robotic arm 635may retrieve the wafer 702 from the wafer container 700 to the housing633, or the robotic arm 635 may transport the wafer 702 to and from thewafer load lock chamber 636. However, the locations where the roboticarm 635 may transport the wafer 702 are not limited by the presentembodiment.

The wafer load lock chamber 636 is located between the wafer interfacemodule 634 and the exposure chamber 650. The wafer load lock chamber 636is configured for preserving the atmosphere within the exposure chamber650 by separating it from the wafer interface module 634. The wafer loadlock chamber 636 is capable of creating an atmosphere compatible withthe exposure chamber 650 or the wafer interface module 634, depending onwhere the wafer is scheduled to be next. This can be performed byaltering the gas content of the wafer load lock chamber 636 by suchmeans as adding gas or creating a vacuum, along with other suitablemeans for adjusting the atmosphere in the wafer load lock chamber 636.

In some embodiments, the exposure chamber 650 includes a cover handlingmodule 618, a transfer mechanism 620, a reticle exchanging station 622,a reticle electrostatic-clamp (E-clamp) 624, a wafer electrostatic-clamp(E-clamp) 626 and a radiation source 628. The exposure chamber 650preserves a vacuum environment at an ultra-high vacuum pressure in arange from about 10⁻⁶ Pa to about 10⁻¹⁰ Pa. The cover handling module618, the transfer mechanism 620, the reticle exchanging station 622, thereticle E-clamp 624, the wafer electrostatic-clamp 626 and the radiationsource 628 are positioned in the exposure chamber 650. The coverhandling module 618 is configured for storing one or more covers 542removed from the inner pod 540. In some embodiments, the cover handlingmodule 618 includes a number of holding members 619 for supporting thecovers 542 removed from the inner pod 540. The reticle E-clamp 624 isconfigured for securing the reticle 400 during the lithography exposureprocess. The wafer E-clamp 626 is configured for securing the waferduring the lithography exposure process. In some embodiments, thereticle E-clamp 624 and the wafer E-clamp 626 create a clamping force bygenerating an electrostatic field.

The reticle exchanging station 622 is configured to support thebaseplate 544 of the inner pod 540 before the reticle 400 is secured bythe reticle E-clamp 624 or after the baseplate 544 is released from thereticle E-clamp 624. In some embodiments, the reticle exchanging station622 is positioned relative to the reticle E-clamp 624. In some otherembodiments, the reticle exchanging station 622 is able to be moved by adriving member, such as linear motor (not shown). To place the reticle400 on a preset position of the reticle E-clamp 624, an alignment tool(such as a camera, not shown in figures) produces information about theposition of the reticle exchanging station 622 and/or the reticleE-clamp 624, and the reticle exchanging station 622 is moved by usingthe information from the alignment tool to perform an alignment processon the reticle exchanging station 622 relative to the reticle E-clamp624.

The transfer mechanism 620 is configured to transfer the inner pod 12 orthe baseplate 544 of the inner pod 540 within the exposure chamber 650.The transfer mechanism 620 may be elevated, moved leftward andrightward, moved forward and backward, and rotated around the verticalaxis so as to transfer the inner pod 540 or the baseplate 544 of theinner pod 540 among the reticle load lock chamber 616, the coverhandling module 618, and the reticle exchanging station 622.

FIG. 8 is a simplified flowchart of a method 800 for discharging staticcharges accumulated on the reticle 400, in accordance with someembodiments. For illustration, the flowchart will be described alongwith the drawings shown in FIG. 7 and FIGS. 9-13. Some of the describedstages can be replaced or eliminated in different embodiments.

The method 800 may include an operation 802, in which the reticlecontainer 500 with the reticle 400 is placed into the lithography system600. In some embodiments, the reticle 400 includes the stack 250 and theconductive material structure 220 connecting the absorption structure212 and the conductive layer 218 of the reticle 400 (FIGS. 1, 2A and2B). In some embodiments, the reticle container 500 includes the outerpod 510 and the inner pod 540. In addition, the discharging device 550is positioned on the baseplate 540 and in the inner pod 540 (FIGS. 4 and5A-5C).

In some embodiments, to perform a lithography exposure process using thereticle 400, the reticle container 500 which contains the reticle 400 inthe inner pod 540 is placed on the reticle load port 612 of thelithography system 600, as shown in FIG. 7. After the reticle container500 is placed on the reticle load port 612, the inner pod 540 is removedfrom the outer pod 510 by the robotic arm 615 and moved toward thereticle load lock chamber 616, in the direction indicated by the arrowin FIG. 9.

In some embodiments, the method 800 may further include placing a wafercontainer 700 with wafers 702 into the lithography system 600. The wafercontainer 700 which contains the wafers 702 is placed on the wafer loadport 632 of the lithography system 600, as shown in FIG. 7. After thewafer container 700 is placed on the wafer load port 632, the wafer 702is removed from the wafer container 700 by the robotic arm 635 and movedtoward the wafer load lock chamber 636, in the direction indicated bythe arrow in FIG. 9.

The method 800 also includes an operation 804, in which the staticcharges accumulated on the reticle 400 are neutralized by positivelycharged particles 562 or negatively charged particles 564 (FIG. 6)produced by the discharging device 550 when the reticle 400 is containedin the reticle container 500. For example, when the reticle 400 istransferred from the reticle load port 612 and moved toward the reticleload lock chamber 616 in an ambient environment, the induced staticcharges that have accumulated on the reticle 400 may be neutralized bypositively charged particles 562 or negatively charged particles 564(FIG. 6) produced by the discharging device 550 in the inner pod 540,shown in FIGS. 7 and 9 and 10.

When the inner pod 540 is placed in the reticle load lock chamber 616,the robotic arm 615 returns to the housing 613 in the reticle interfacemodule 614, as shown in FIG. 10. At this time, the reticle load lockchamber 616 is sealed and an atmosphere compatible with the vacuumpressure in the exposure chamber 650 is created by altering the gascontent of the reticle load lock chamber 616 by such means as adding gasor creating a vacuum, along with other suitable means for adjusting theatmosphere in the reticle load lock chamber 616. When the correctatmosphere has been reached, the transfer mechanism 620 removes theinner pod 540 from the reticle load lock chamber 616. As a result, theinner pod 540, along with the reticle 400, is transferred from anambient environment (i.e. space in the outer pod 510 and the housing613) to a vacuum environment (i.e. space in the exposure chamber 650) inthe reticle load lock chamber 616 after the reticle container 500 withthe reticle 400 are placed into the lithography system 600, as shown inFIG. 10.

For example, when the inner pod 540 along with the reticle 400 istransferred from the ambient environment to the vacuum environment, thestatic charges accumulated on the reticle 400 may be continuously or maybe intermittently neutralized by positively charged particles 562 ornegatively charged particles 564 (FIG. 6) produced by the dischargingdevice 550 when the reticle 400 is contained in the inner pod 540.

In some embodiments, the method 800 may further include transferring thewafer 702 from the atmosphere to the vacuum environment. When the wafer702 is placed in the wafer load lock chamber 636, the wafer 702 istransferred from an ambient environment (i.e. space in the wafercontainer 700 and the housing 633) to a vacuum environment (i.e. spacein the exposure chamber 650). Afterward, the transfer mechanism 640removes the wafer 702 from the wafer load lock chamber 636, as shown inFIG. 10.

The method 800 also includes an operation 806, in which the reticle 400from the inner pod 540 of the reticle container 500 is removed to thereticle E-clamp 624 in the lithography system 600. In some embodiments,after the inner pod 540 is moved into the vacuum environment, the innerpod 540 is transferred to the cover handling chamber 618 by the transfermechanism 620, as shown in FIG. 11. In the cover handling chamber 618,the flanges 543 of the cover 542 are supported by the holding members619, and the cover 542 is left on the holding member 619 by moving thebaseplate 544 in the direction indicated by the arrow in FIG. 11. As aresult, the cover 542 is removed from the baseplate 544 and thedischarge device 550 of the inner pod 540 in the vacuum environment. Atthis time, the reticle 400 is placed on the discharging device 550 andthe baseplate 544, and the baseplate 544 is exposed to the vacuumenvironment.

For example, when the reticle 400 on the baseplate 544 is exposed to thevacuum environment (e.g., the space in the exposure chamber 650), thestatic charges accumulated on the reticle 400 may be continuously or maybe intermittently neutralized by positively charged particles 562 ornegatively charged particles 564 (FIG. 6) produced by the dischargingdevice 550 when the reticle 400 is contained in the inner pod 540.

In some embodiments, the method 800 may further include removing thewafer 702 toward to the wafer E-clamp 626. In some embodiments, afterthe wafer 702 is moved into the vacuum environment, the wafer 702 istransferred to the in the exposure chamber 650 by the transfer mechanism640, as shown in FIG. 11.

In some embodiments, after the cover 542 is removed from the baseplate544, the discharging device 550 and reticle 400 are placed on thereticle exchanging station 622 by the transfer mechanism 620, as shownin FIG. 12. For example, the reticle exchanging station 622 may belocated in a position below the reticle electrostatic-clamp 624.

In some embodiments, the method 800 may further include placing thewafer 702 on the wafer E-clamp 626. As a result, the wafer 702 may besecured by the wafer E-clamp 626 with the clamping force generated bythe wafer E-clamp 626 and is ready for the lithography exposure process,such as being subjected to an extreme ultraviolet (EUV) light.

Afterwards, the reticle exchanging station 622 is elevated to a loadingposition 629 as indicated by the dotted lines in FIG. 13 to create adirect contact between the reticle 400 and the reticle E-clamp 624. As aresult, the reticle 400 may be secured by the reticle E-clamp 624 withthe clamping force generated by the reticle E-clamp 624 and is ready forthe lithography exposure process, such as being subjected to an extremeultraviolet (EUV) light. After the reticle 400 is secured by the reticleE-clamp 624, the vacant baseplate 544 is lowered down to its originalposition 631 as indicated by solid lines in FIG. 13.

When the reticle 400 is in contact with the reticle E-clamp 624, theconductive material structure 220 is electrically connected to thereticle E-clamp 624 through the conductive layer 218. Therefore, thestatic charges accumulated on the reticle 400 are conducted to thereticle E-clamp 624 by the conductive material structure 220 and theconductive layer 218, as shown in FIG. 14.

After the removal of the reticle from the pod to the reticleelectrostatic-clamp, a lithography exposure process is performed on thewafer 702 in the vacuum environment using the reticle 400 and theradiation source 628, as shown in FIG. 13. In some embodiments, theradiation source 628 is configured to generate EUV radiation 660 with awavelength centered at about 13.5 nm. For example, the radiation source628 utilizes laser-produced plasma (LPP) to generate the EUV radiation660 by heating a medium such as droplets of tin into a high-temperatureplasma using a laser.

The EUV radiation 660 produced by the radiation source 628 may befocused and shapes by an illuminator module (not shown). The illuminatormodule may include refractive optical components, including monolithiclenses and/or array lenses (e.g. zone plates), and may includereflective optical components, including monolithic mirrors and/ormirror arrays. The optical components are arranged and aligned toproject radiation emitted by the radiation source 628 onto the reticle400 retained in the reticle E-clamp 624. The optical components of theilluminator module may also shape the radiation along the light path inorder to produce a particular illumination pattern (e.g., the absorptionstructure 212 in the pattern region 410) upon the reticle 400.

After being absorbed or reflecting off the reticle 400, the radiation isdirected through a projection module (not shown), also referred to as aprojection optics box (POB). Similar to the illuminator module, theprojection module may include refractive optical components. The opticalcomponents of the projection module are arranged and aligned to directradiation transmitted through or reflecting off the reticle 400 and toproject that radiation onto the wafer 702, which is secured to the waferE-clamp 626.

When the lithography exposure process is performed, the static chargesaccumulated on the reticle 400 (e.g. on the front-side surface 252 ofthe reticle 400) are conducted to the reticle E-clamp 624 by theconductive material structure 220 and the conductive layer 218, as shownin FIG. 14.

After the lithography exposure process is performed, the reticle 400 isremoved from the reticle E-clamp 624 to the baseplate 544 of the reticlecontainer 500 by the transfer mechanism 620, as shown in FIG. 12.Afterward, the cover 542 may rejoin to the baseplate 544 with thedischarge device 550 together to form the inner pod 540 in the exposurechamber 650 in the vacuum environment.

Afterward, the reticle 400 secured by the inner pod 540 may betransferred from exposure chamber 650 to the reticle load lock chamber616 in the vacuum environment. At this time, the reticle load lockchamber 616 may capable of creating an atmosphere compatible with thereticle interface module 614. When the correct atmosphere has beenreached, the robotic arm 615 removes the inner pod 540 from the reticleload lock chamber 616 to the reticle interface module 614. As a result,the inner pod 540, along with the reticle 400, is transferred from thevacuum environment (i.e. the space in the exposure chamber 650) to theambient environment (i.e. the space in the outer pod 510 and the housing613).

Afterward, the inner pod 540 in the reticle load lock chamber 616 ismoved toward the reticle load port 612 and placed into the outer pod 510by the robotic arm 615. Therefore, the reticle 400 is placed in thereticle container 500.

For example, during the transferring path of the reticle 400 from thereticle E-clamp 624 to the reticle container 500 after performing thelithography exposure process, the reticle 400 may be placed on thebaseplate 544 with the discharging device 550. Therefore, the staticcharges accumulated on the reticle 400 may be continuously or may beintermittently neutralized by positively charged particles 562 ornegatively charged particles 564 (FIG. 6) produced by the dischargingdevice 550.

After the lithography exposure process is performed, the wafer 702 isremoved from the wafer E-clamp 626 and transferred back to the waferload port 632 and placed into the wafer container 700. Morespecifically, the wafer 702 may be removed from the wafer E-clamp 626 inthe exposure chamber 650 to the wafer load lock chamber 636 by thetransfer mechanism 640 in the vacuum environment. When the wafer 702 isplaced in the wafer load lock chamber 636, the wafer 702 is transferredfrom the vacuum environment to the ambient environment. Afterward, thewafer 702 in the wafer load lock chamber 636 may be moved toward thewafer load port 632 and placed into the wafer container 700 by therobotic arm 635.

In some embodiments, the method 800 for discharging static chargesaccumulated on the reticle 400 is utilized in the lithography system 600to perform a lithography exposure process. For example, the method 800may uses the reticle 400 (FIGS. 1, 2A and 2B) secured in the reticlecontainer 500 (FIGS. 4, 5A, 5B and 5C). When the reticle 400 is placedon the baseplate 544 of the reticle container 500 in the ambientenvironment or the vacuum environment, the static charges accumulated onthe reticle 400 may be continuously or intermittently neutralized bypositively charged particles 562 or negatively charged particles 564produced by the discharging device 550 on the baseplate 544. Therefore,the reticle container 500 may prevent the reticle 400 from theparticulate contamination in the ambient environment or the vacuumenvironment. When the reticle 400 is in contact with the reticle E-clamp624 (ready for the lithography exposure process or during thelithography exposure process), the conductive material structure 220 ofthe reticle 400 is electrically connected to the reticle E-clamp 624.The static charges accumulated on the reticle 400 are conducted to thereticle E-clamp 624 by the conductive material structure 220 of thereticle 400. Therefore, the conductive material structure 220 mayprotect the absorption structure 212 in the pattern region 410 of thereticle 400 from the electrostatic discharge damage.

As described previously, the reticle (e.g., the reticles 400, 400A,400B, 400C and 400D) includes a conductive material structure (e.g. theconductive material structures 220, 220A, 220B, 220C and 220D) over thesidewall surface 211 of the mask substrate 200 and the sidewall surface213 of the absorption structure 212. In some embodiments, the conductivematerial structure is in contact with the absorption structure and theconductive layer over the back-side surface 203 of mask substrate 200.The conductive material structure may conduct the static chargesaccumulated on the front-side surface 252 of the reticle 400 to thereticle electrostatic-clamp (e.g. the reticle E-clamp 624 in thelithography system 600) when the conductive material structure of thereticle is in contact with the reticle electrostatic-clamp. Therefore,the conductive material structure may protect the opaque regions 214 ofabsorption structure 212 (e.g., the reticle patterns) of the reticlefrom the electrostatic discharge damage.

As described previously, the reticle container 500 includes thedischarging device 550 on the baseplate 544. In some embodiments, thedischarging device is configured to neutralize static chargesaccumulated on the reticle. When the reticle is contained in the reticlecontainer 500 or placed on the baseplate 544 in the ambient environmentor the vacuum environment, the discharging device may continuously orintermittently produce the positively charged particles 562 or thenegatively charged particles 564 to neutralize the static chargesaccumulated on the reticle 400.

As described previously, the method 800 for discharging static chargesaccumulated on the reticle 400 includes neutralizing static chargesaccumulated on the reticle by the positively charged particles 562 orthe negatively charged particles 564 produced by the discharging device550 when the reticle 400 is contained in the reticle container 500 (e.g.on the baseplate 540 and in the inner pod 540). Therefore, the reticlecontainer 500 may prevent the reticle 400 from the particulatecontamination in the ambient environment or the vacuum environment. Inaddition, the method 800 for discharging static charges accumulated onthe reticle 400 may include conducting the static charges accumulated onthe reticle 400 to the reticle electrostatic-clamp 624 by the conductivematerial structure 220 when the conductive material structure 220 of thereticle 400 is in contact with the reticle electrostatic-clamp 624 inthe lithography system 600. Therefore, the conductive material structure220 may protect the absorption structure 212 in the pattern region 410of the reticle 400 from the electrostatic discharge damage.

Embodiments of a reticle, a reticle container and a method fordischarging static charges accumulated on a reticle are provided. Thereticle includes a mask substrate, a reflective multilayer (ML)structure, a capping layer, an absorption structure and a conductivematerial structure. The mask substrate has a front-side surface and aback-side surface. The reflective ML structure is positioned over thefront-side surface of mask substrate. The capping layer is positionedover the reflective ML structure. The absorption structure is positionedover the capping layer. The conductive material structure is positionedover a sidewall surface of the mask substrate and a sidewall surface ofthe absorption structure. The conductive material structure may protectthe absorption structure in the pattern region of the reticle from theelectrostatic discharge damage.

In some embodiments, a reticle is provided. The reticle includes a masksubstrate, a reflective multilayer (ML) structure, a capping layer, anabsorption structure and a conductive material structure. The masksubstrate has a front-side surface and a back-side surface. Thereflective ML structure is positioned over the front-side surface ofmask substrate. The capping layer is positioned over the reflective MLstructure. The absorption structure is positioned over the cappinglayer. The conductive material structure is positioned over a sidewallsurface of the mask substrate and a sidewall surface of the absorptionstructure.

In some embodiments, a reticle container is provided. The reticlecontainer includes a cover, a baseplate and a discharging device. Thecover is configured to protect a reticle. The baseplate has a topsurface configured to engage to the cover and a bottom surface oppositeto the top surface. The discharging device is positioned on thebaseplate. The discharging device is configured to neutralize staticcharges accumulated on the reticle.

In some embodiments, a method for discharging static charges accumulatedon a reticle is provided. The method includes neutralizing staticcharges accumulated on the reticle by positively charged particles ornegatively charged particles produced by a discharging device when thereticle is contained in a reticle container. The method further includesremoving the reticle from the reticle container to a reticleelectrostatic-clamp in a lithography system.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A reticle, comprising: a mask substrate having afront-side surface and a back-side surface; a reflective multilayer (ML)structure over the front-side surface of mask substrate; a capping layerover the reflective ML structure; an absorption structure over thecapping layer; and a conductive material structure over a sidewallsurface of the mask substrate and a sidewall surface of the absorptionstructure.
 2. The reticle as claimed in claim 1, further comprising: aconductive layer over the back-side surface of mask substrate, whereinthe conductive material structure is in contact with the absorptionstructure and the conductive layer.
 3. The reticle as claimed in claim2, wherein the conductive material structure surrounds the conductivelayer.
 4. The reticle as claimed in claim 1, wherein the conductivematerial structure comprises a plurality of conductive strips, whereineach of the conductive strips has two terminals in contact with theabsorption structure and the conductive layer, respectively.
 5. Thereticle as claimed in claim 1, wherein the conductive material structureis spiral-shaped about an axis perpendicular to the front-side surfaceof the mask substrate.
 6. The reticle as claimed in claim 1, wherein thereticle comprises: a pattern region; and a border region surrounding thepattern region and separated from the pattern region; and a bridgeregion between the pattern region and the border region, wherein thebridge region connects the pattern region and the border region, whereinthe capping layer and the absorption structure are positioned in thepattern region, the border region and the bridge region.
 7. The reticleas claimed in claim 6, wherein the absorption structure in the patternregion and the absorption structure in the border region areelectrically connected to the capping layer.
 8. A reticle container,comprising: a cover configured to protect a reticle; a baseplate having:a top surface configured to engage to the cover, and a bottom surfaceopposite to the top surface; and a discharging device on the baseplate,wherein the discharging device is configured to neutralize staticcharges accumulated on the reticle.
 9. The reticle container as claimedin claim 8, wherein the top surface of the baseplate has a reticleregion configured to support the reticle and a peripheral regionsurrounding the reticle region.
 10. The reticle container as claimed inclaim 8, wherein the discharging device comprises an alpha-ionizerconfigured to emit alpha particles.
 11. The reticle container as claimedin claim 8, wherein a top surface of the discharging device is betweenthe top surface and the bottom surface of the baseplate.
 12. The reticlecontainer as claimed in claim 8, wherein the discharging device ispositioned in a recessed groove of the baseplate.
 13. The reticlecontainer as claimed in claim 12, wherein a bottom surface of therecessed groove is between the top surface and the bottom surface of thebaseplate.
 14. A method for discharging static charges accumulated on areticle, comprising: neutralizing static charges accumulated on thereticle by positively charged particles or negatively charged particlesproduced by a discharging device of a reticle container when the reticleis contained in the reticle container; and removing the reticle from thereticle container to a reticle electrostatic-clamp in a lithographysystem.
 15. The method for discharging static charges accumulated on areticle as claimed in claim 14, wherein the reticle comprises aconductive material structure connecting a mask substrate of the reticleand an absorption structure of the reticle, the method furthercomprising: conducting the static charges accumulated on the reticle tothe reticle electrostatic-clamp by the conductive material structurewhen the conductive material structure of the reticle is in contact withthe reticle electrostatic-clamp
 16. The method for discharging staticcharges accumulated on a reticle as claimed in claim 14, furthercomprising: transferring the reticle container with the reticle from anambient environment to a vacuum environment in the lithography systembefore removing the reticle from the reticle container to the reticleelectrostatic-clamp in the lithography system.
 17. The method fordischarging static charges accumulated on a reticle as claimed in claim14, further comprising: performing a lithography exposure process in thevacuum environment using the reticle after the removal of the reticlefrom the reticle container to the reticle electrostatic-clamp.
 18. Themethod for discharging static charges accumulated on a reticle asclaimed in claim 14, wherein removing the reticle from the reticlecontainer to the reticle electrostatic-clamp further comprises: removinga cover of the reticle container from a baseplate and the dischargingdevice of the reticle container in the vacuum environment; andtransferring the reticle and the baseplate of the reticle container to aposition below the reticle electrostatic-clamp in the vacuumenvironment.
 19. The method for discharging static charges accumulatedon a reticle as claimed in claim 16, wherein the reticle container withthe reticle is transferred from the ambient environment to the vacuumenvironment when the reticle container and the reticle are placed in areticle load lock chamber of the lithography system.
 20. The method fordischarging static charges accumulated on a reticle as claimed in claim17, further comprising: removing the reticle from the reticleelectrostatic-clamp to the reticle container after performing thelithography exposure process.